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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1261-1265

Friction force microscopy study on photodegradation of organosilane self-assembled monolayers irradiated with a vacuum ultraviolet light at 172 nm

(5) Sugimura, Hiroyuki a Hayashi, Kazuyuki a Amano, Yukihiro a Takai, Osamu a Hozumi, Atsushi b

a NAGOYA UNIVERSITY (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CONTACT ANGLE; DECOMPOSITION; ELECTRON IRRADIATION; FRICTION; OXIDATION; PHOTODEGRADATION; PHOTODISSOCIATION; PHOTOLITHOGRAPHY; SILANES; SUBSTRATES; ULTRAVIOLET LAMPS; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

FRICTION FORCE MICROSCOPY; MICROPATTERNING; PHOTOPRINTING;

SELF ASSEMBLY;

EID: 0035393962 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1339023 Document Type: Article

Times cited : (25)

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