Photolithography based on organosilane self-assembled monolayer resist

Electrochimica Acta

Volumn 47, Issue 1, 2001, Pages 103-107

  Sugimura, Hiroyuki ^a   Hanji, Takayuki ^a   Takai, Osamu ^a   Masuda, Takao ^b   Misawa, Hiroaki ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Electroless plating; Organosilane self assembled monolayer; Photolithography; Plasma etching

Indexed keywords

MONOLAYERS; PHOTORESISTS; SELF ASSEMBLY; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION; VACUUM TECHNOLOGY;

ORGANOSILANES;

ELECTROLESS PLATING;

EID: 0035450616     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(01)00554-0     Document Type: Article

References (3)

1. E.P. Plueddemann, Silane Coupling Reagents, Plenum Press, New York, 1991.
2. J. Sagiv, J. Am. Chem. Soc. 102 (1980) 92.
3. D.A. Stenger, J.H. Georger, C.S. Dulcey, J.J. Hickman, A.S. Rudolph, T.B. Nielsen, S.M. McCort, J.M. Calvert, J. Am. Chem. Soc. 114 (1992) 8435.