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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 4 A, 2003, Pages

Alkylsilane self-assembled monolayer photolithography: Effects of proximity gap on photodegradation and patterning resolution

(5) Hong, Lan a Sugimura, Hiroyuki a Takai, Osamu a Nakagiri, Nobuyuki b Okada, Masashi b

a NAGOYA UNIVERSITY (Japan)

b NIKON CORPORATION (Japan)

Author keywords

Alkylsilane; Photodegradation; Photolithography; Proximity gap; Self assembled monolayer (SAM); Vacuum ultraviolet

Indexed keywords

CONTACT ANGLE; IRRADIATION; MASKS; PHOTOCHEMICAL REACTIONS; PHOTODEGRADATION; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILANES; SUBSTRATES; THICKNESS MEASUREMENT; VACUUM APPLICATIONS;

ALKYLSILANE; PROXIMITY GAP; VACUUM ULTRAVIOLET LIGHT;

MONOLAYERS;

EID: 0038383075 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.l394 Document Type: Letter

Times cited : (14)

References (19)

1
- 0026431974
- C. S. Dulcey, J. H. Georger, Jr., V. Krauthamer, D. A. Stenger, T. L. Fare and J. M. Calvert: Science 252 (1991) 551.
- (1991) Science , vol.252 , pp. 551
- Dulcey, C.S.¹ Georger J.H., Jr.² Krauthamer, V.³ Stenger, D.A.⁴ Fare, T.L.⁵ Calvert, J.M.⁶

2
- 0003081693
- N. Ichinose, H. Sugimura, T. Uchida, H. Shimo and H. Masuhara: Chem. Lett. (1993) 1961.
- (1993) Chem. Lett. , pp. 1961
- Ichinose, N.¹ Sugimura, H.² Uchida, T.³ Shimo, H.⁴ Masuhara, H.⁵

3
- 0001749616
- M. J. Lercel, R. C. Tiberio, P. F. Chapman, H. G. Craighead, C. W. Sheen, A. N. Parikh and D. L. Allara: J. Vac. Sci. & Technol. B 11 (1993) 2823.
- (1993) J. Vac. Sci. & Technol. B , vol.11 , pp. 2823
- Lercel, M.J.¹ Tiberio, R.C.² Chapman, P.F.³ Craighead, H.G.⁴ Sheen, C.W.⁵ Parikh, A.N.⁶ Allara, D.L.⁷

4
- 0028404161
- P. C. Rieke, B. J. Tarasevich, L. L. Wood, M. H. Engelhard, D. R. Baer, G. E. Fryxell, C. M. John, D. A. Laken and M. C. Jaehnig: Langmuir 10 (1994) 619.
- (1994) Langmuir , vol.10 , pp. 619
- Rieke, P.C.¹ Tarasevich, B.J.² Wood, L.L.³ Engelhard, M.H.⁴ Baer, D.R.⁵ Fryxell, G.E.⁶ John, C.M.⁷ Laken, D.A.⁸ Jaehnig, M.C.⁹

5
- 0029370682
- Y. Xia, M. Mrksich, E. Kim and G. M. Whitesides: J. Am. Chem. Soc. 117 (1995) 9576.
- (1995) J. Am. Chem. Soc. , vol.117 , pp. 9576
- Xia, Y.¹ Mrksich, M.² Kim, E.³ Whitesides, G.M.⁴

6
- 21544435813
- C. R. K. Marrian, F. K. Perkins, S. L. Brandow, T. S. Koloski, E. A. Dobisz and J. M. Calvert: Appl. Phys. Lett. 64 (1994) 390.
- (1994) Appl. Phys. Lett. , vol.64 , pp. 390
- Marrian, C.R.K.¹ Perkins, F.K.² Brandow, S.L.³ Koloski, T.S.⁴ Dobisz, E.A.⁵ Calvert, J.M.⁶

7
- 0000094294
- H. Sugimura and N. Nakagiri: Langmuir 11 (1995) 3623.
- (1995) Langmuir , vol.11 , pp. 3623
- Sugimura, H.¹ Nakagiri, N.²

8
- 0030760555
- H. Sugimura and N. Nakagiri: J. Am. Chem. Soc. 119 (1997) 9226.
- (1997) J. Am. Chem. Soc. , vol.119 , pp. 9226
- Sugimura, H.¹ Nakagiri, N.²

9
- 0032633145
- S. L. Bradow, M. S. Chen, R. Aggarwal, S. C. Dulcey, J. M. Calvert and W. J. Dressick: Langmuir 15 (1999) 5429.
- (1999) Langmuir , vol.15 , pp. 5429
- Bradow, S.L.¹ Chen, M.S.² Aggarwal, R.³ Dulcey, S.C.⁴ Calvert, J.M.⁵ Dressick, W.J.⁶

10
- 0000715957
- H. Sugimura and N. Nakagiri: Appl. Phys. A 66 (1998) S427.
- (1998) Appl. Phys. A , vol.66
- Sugimura, H.¹ Nakagiri, N.²

11
- 0034620411
- H. Sugimura, K. Ushiyama, A. Hozumi and O. Takai: Langmuir 16 (2000) 885.
- (2000) Langmuir , vol.16 , pp. 885
- Sugimura, H.¹ Ushiyama, K.² Hozumi, A.³ Takai, O.⁴

12
- 0035121326
- X. M. Yang, R. D. Peters, T. K. Kim, P. F. Nealey, S. L. Brandow, M.-S. Chen, L. M. Shirey and W. J. Dressick: Langmuir 17 (2001) 228.
- (2001) Langmuir , vol.17 , pp. 228
- Yang, X.M.¹ Peters, R.D.² Kim, T.K.³ Nealey, P.F.⁴ Brandow, S.L.⁵ Chen, M.-S.⁶ Shirey, L.M.⁷ Dressick, W.J.⁸

13
- 22644450715
- S. B. Hill, C. A. Haich, F. B. Dunning, G. K. Walters, J. J. McCelland and R. J. Celotta: J. Vac. Sci. & Technol. B 17 (1999) 1087.
- (1999) J. Vac. Sci. & Technol. B , vol.17 , pp. 1087
- Hill, S.B.¹ Haich, C.A.² Dunning, F.B.³ Walters, G.K.⁴ McCelland, J.J.⁵ Celotta, R.J.⁶

14
- 0013144369
- H. Sugimura, K. Hayashi, N. Saito, L. Hong, O. Takai, A. Hozumi, N. Nakigiri and M. Okada: Trans. Mater. Res. Soc. Jpn. 27 (2002) 545.
- (2002) Trans. Mater. Res. Soc. Jpn. , vol.27 , pp. 545
- Sugimura, H.¹ Hayashi, K.² Saito, N.³ Hong, L.⁴ Takai, O.⁵ Hozumi, A.⁶ Nakigiri, N.⁷ Okada, M.⁸

15
- 0036693486
- H. Sugimura, A. Hozumi, T. Kameyama and O. Takai: Surf. Interf. Anal. 34 (2002) 550.
- (2002) Surf. Interf. Anal. , vol.34 , pp. 550
- Sugimura, H.¹ Hozumi, A.² Kameyama, T.³ Takai, O.⁴

16
- 0037461660
- N. Saito, Y. Wu, K. Hayashi, H. Sugimura and O. Takai: J. Phys. Chem. B 107 (2003) 667.
- (2003) J. Phys. Chem. B , vol.107 , pp. 667
- Saito, N.¹ Wu, Y.² Hayashi, K.³ Sugimura, H.⁴ Takai, O.⁵

17
- 0038447891
- (The Royal Society of Chemistry, Cambridge)
- A. R. Bandy: The Chemistry of the Atmosphere (The Royal Society of Chemistry, Cambridge, 1995).
- (1995) The Chemistry of the Atmosphere
- Bandy, A.R.¹

18
- 0035393962
- H. Sugimura, K. Hayashi, Y. Amano, O. Takai and A. Hozumi: J. Vac. Sci. & Technol. A 19 (2001) 1261.
- (2001) J. Vac. Sci. & Technol. A , vol.19 , pp. 1261
- Sugimura, H.¹ Hayashi, K.² Amano, Y.³ Takai, O.⁴ Hozumi, A.⁵

19
- 0004093537
- (Oxford University Press), 2nd ed.
- L. F. Thompson, C. G. Wilson and M. J. Bowden: Introduction to Microlithography (Oxford University Press, 1994), 2nd ed., p. 120.
- (1994) Introduction to Microlithography , pp. 120
- Thompson, L.F.¹ Wilson, C.G.² Bowden, M.J.³

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