Aerial-image modeling for the extreme ultraviolet microfield exposure tool at SEMATECH North

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Naulleau, Patrick ^a   Dean, Kim ^b   Lowack, Klaus ^b  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

Author keywords

Aerial image; Extreme ultraviolet; Lithography; Modeling; Resist

Indexed keywords

AERIAL IMAGE; AERIAL-IMAGE PERFORMANCE; EXTREME ULTRAVIOLET; RESIST;

COMPUTER SIMULATION; OPTICAL RESOLVING POWER; PHOTORESISTS; SENSITIVITY ANALYSIS; ULTRAVIOLET RADIATION;

IMAGE PROCESSING;

EID: 33745615375     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657001     Document Type: Conference Paper

References (19)

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