EUV mask and chuck analysis - Simulation and experimentation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Nataraju, Madhura ^a   Sohn, Jaewoong ^a   Mikkelson, Andrew R ^a   Turner, Kevin T ^a   Engelstad, Roxann L ^a   Van Peski, Chris K ^b  

^a University of Wisconsin Madison   (United States)

^b SEMATECH   (United States)

Author keywords

Electrostatic chucking experiments; EUV lithography; Finite element analysis; Flatness specifications

Indexed keywords

ELECTROSTATIC CHUCKING EXPERIMENTS; EUV LITHOGRAPHY; FLATNESS SPECIFICATIONS; SURFACE FLATNESS;

CLAMPING DEVICES; COMPUTER SIMULATION; ELECTROSTATIC DEVICES; FINITE ELEMENT METHOD; INTERFEROMETERS; LITHOGRAPHY;

MASKS;

EID: 33745602194     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657154     Document Type: Conference Paper

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