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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2371-2377

Generation mechanism of residual clamping force in a bipolar electrostatic chuck

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CLAMPING DEVICES; DIELECTRIC MATERIALS; ELECTRIC CHARGE; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTROSTATIC DEVICES; EQUIVALENT CIRCUITS; FORCE MEASUREMENT; PERMITTIVITY; POLARIZATION; POLYETHYLENES; SILICON WAFERS; VOLTMETERS;

BIPOLAR ELECTROSTATIC CHUCKS; CONTACT RESISTANCE; RESIDUAL CLAMPING FORCES;

CHUCKS;

EID: 0942267568 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (24)

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