EUV mask development: Material and process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4764, Issue , 2002, Pages 32-37

  Rau, Jenspeter ^a   Wendt, Hermann ^a   Mathuni, Josef ^a   Stepper, Christoph ^a   Ehrmann, Albrecht ^a   Kamm, Frank Michael ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; CLEANING; DRY ETCHING; FINITE ELEMENT METHOD; OPTICS; PHOTOLITHOGRAPHY; SILICA; TANTALUM COMPOUNDS; ULTRAVIOLET RADIATION; X RAYS;

CHROME ON GLASS MASK; EXTREME ULTRAVIOLET LITHOGRAPHY; TANTALUM NITRIDE;

MASKS;

EID: 0036440182     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.479358     Document Type: Article

References (7)

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4. P. B. Mirkarimi, S. Bajt and M.A. Wall, Appl. Opt. 39, 1617 (2000).
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6. M. Shiraishi, W. Ishiyama, T. Oshino and K. Murakami, Jpn. J. Appl. Phys. 39, 6810 (2000)
7. C. Montcalm, Opt. Eng. 40, 469 (2001)