Production challenges of making an EUV mask blank

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5504, Issue , 2004, Pages 94-104

  Aschke, Lutz ^a   Becker, Hans ^a   Friemel, Falk ^a   Leutbecher, Thomas ^a   Olschewski, Nathalie ^a   Renno, Markus ^a   Rüggeberg, Frauke ^a   Schiffler, Mario ^a   Schmidt, Frank ^a   Sobel, Frank ^a   Walter, Kurt ^a   Heß, Günter ^a   Lenzen, Frank ^a   Knapp, Konrad ^a   Alkemper, Jochen ^b   Hack, Hrabanus ^b   Megges, Klaus ^b   Mitra, Ina ^b   Müller, Rolf ^b   Nolte, Uwe ^b   Schumacher, Jörg ^b   Pannhorst, Wolfgang ^b   more..

^a Schott Lithotec AG   (Germany)

^b SCHOTT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRIC RESISTANCE; ELECTROSTATICS; FABRICATION; INTEGRATED CIRCUITS; LITHOGRAPHY; PARAMETER ESTIMATION; RESEARCH AND DEVELOPMENT MANAGEMENT; SILICA; STANDARDS; THERMAL EXPANSION;

CLEANING TECHNIQUES; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MULTILAYER COATINGS; OPTICAL RESPONSE;

MASKS;

EID: 3843113254     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568007     Document Type: Conference Paper

References (8)

1. C.W. Gwyn, P.J. Silvermann, EUV Lithography Transition from Research to Commercialization, Proc. SPIE 4889, 2003
2. H. Becker et al., High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition, Proc. SPIE 4889, 389-399, 2002
3. J.A. Folta et al., Low-defect EUVL multilayers on standard-format mask, blanksProc. SPIE 4889, 374-381, 2002
4. H. Bach. Ed., Low Thermal Expansion Glass Ceramics, Springer, Berlin, 1995
5. I. Mitra, M. J. Davis, J. Alkemper, R. Müller, H. Kohlmann, L. Aschke, E. Mörsen, S. Ritter, H. Hack, W. Pannhorst: "Thermal Expansion Behavior of Proposed EUVL Substrate Materials", Proceedings SPIE Vol. 4688 (2002) p. 462-68
6. SEMI Standard P 37: "Specification for Extreme Ultraviolet Lithography Mask Substrates"
7. J. Tümmler et al., New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region, Proc. SPIE 4688, 338-347, 2002
8. C. Montcalm, P. B. Mirkarimi, High-Reflectance, Low-Stress, Mo-Si Multilayer Reflective Coatings, US Patent #6,110,607, 2000