Electrostatic chucking and EUVL mask flatness analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Nataraju, M ^a   Mikkelson, A ^a   Sohn, J ^a   Engelstad, R L ^a   Lovell, E G ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

Electrostatic chucking; EUV lithography; Finite element analysis; Mask flatness

Indexed keywords

ELECTROSTATIC CHUCKING; EUV LITHOGRAPHY; MASK FLATNESS;

ELECTROSTATICS; FINITE ELEMENT METHOD; IMAGE ANALYSIS; PHOTOLITHOGRAPHY; STANDARDS; ULTRAVIOLET RADIATION;

MASKS;

EID: 33644599741     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.631361     Document Type: Conference Paper

References (13)

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