Vendor capability for low thermal expansion mask substrates for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 767-778

  Blaedel, K L ^a   Taylor, J S ^a   Hector, S D ^b   Yan, P Y ^c   Ramamoorthy, A ^c   Brooker, P D ^d  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b MOTOROLA INC   (United States)

^c INTEL CORPORATION   (United States)

^d SEMATECH   (United States)

Author keywords

EUV lithography; EUVL masks; EUVL reticles; EUVL substrates

Indexed keywords

CRYSTAL DEFECTS; MASKS; SUBSTRATES; SURFACE ROUGHNESS; THERMAL EXPANSION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) RETICLES;

PHOTOLITHOGRAPHY;

EID: 0036380109     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472273     Document Type: Article

References (20)

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