Electrostatic chucks for lithography applications

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 219-222

  Kalkowski, G ^a   Risse, S ^a   Harnisch, G ^a   Guyenot, V ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Dielectric; Electrostatic chuck; Glass ceramic; Johnsen Rahbek; Lithography

Indexed keywords

CHUCKS; ELECTROSTATICS; GLASS CERAMICS; PERMITTIVITY; QUARTZ; SAPPHIRE;

ELECTROSTATIC CHUCKS;

ION BEAM LITHOGRAPHY;

EID: 0035450092     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00519-6     Document Type: Conference Paper

References (6)

1. Manufacturing issues of electrostatic chucks
2. Electrostatic clamping applied to semiconductor plasma processing
3. A physical phenomenon and its application to telegraphy, telephony, etc.
4. Electrostatic force and absorption current of alumina electrostatic chuck
5. Ionic conduction and conduction polarization in oxide glass