Arsenic uphill diffusion during shallow junction formation

Journal of Applied Physics

Volumn 99, Issue 11, 2006, Pages

  Ferri, M ^a   Solmi, S ^a   Parisini, A ^a   Bersani, M ^b   Giubertoni, D ^b   Barozzi, M ^b  

^a CNR   (Italy)

^b ITC IRST   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARSENIC; IMAGING TECHNIQUES; MASKS; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

DOPANT; SCANNING TRANSMISSION ELECTRON MICROSCOPY (STEM); TRANSIENT ENHANCED DIFFUSION (TED);

SEMICONDUCTOR JUNCTIONS;

EID: 33745241362     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2200587     Document Type: Article

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