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Volumn 30, Issue 12, 2005, Pages 967-975

Fabrication of device nanostructures using supercritical fluids

(2)  O'Neil, Adam a   Watkins, James J a  

a NONE

Author keywords

Block copolymer; Mesoporous; Metal deposition; Nanoscale; Polymer; Supercritical fluid

Indexed keywords

BLOCK COPOLYMERS; CARBON DIOXIDE; CLEANING; DEPOSITION; ETCHING; NANOSTRUCTURED MATERIALS; SOLUTIONS; SURFACE TENSION;

EID: 33744462641     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs2005.250     Document Type: Article
Times cited : (58)

References (76)
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    • PhD thesis, University of Massachusetts
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  • 21
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    • A. O'Neil and J.J. Watkins, (2005) unpublished manuscript
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  • 26
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    • J.J. Watkins, J.M. Blackburn, D.P. Long, and J.L. Lazorcik, "Chemical Fluid Deposition Method for the Formation of Metal and Metal Alloy Films on Patterned and Unpatterned Substrates," U.S. Patent 6,689,700 (February 10, 2004).
    • (2004)
    • Watkins, J.J.1    Blackburn, J.M.2    Long, D.P.3    Lazorcik, J.L.4
  • 27
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    • "A Method of Chemically Depositing Material onto a Substrate," U.S. Patent 5,789,027 (August 4)
    • J.J. Watkins and T.J. McCarthy, "A Method of Chemically Depositing Material onto a Substrate," U.S. Patent 5,789,027 (August 4, 1998).
    • (1998)
    • Watkins, J.J.1    McCarthy, T.J.2
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    • "Process of Drying Semiconductor Wafers Using Liquid or Supercritical Carbon Dioxide," U.S. Patent 6,398,875 (June 4)
    • J.M. Cotte, D.L. Goldfarb, K.J. McCullough, W.M. Moreau, K.R. Pope, J.P. Simons, and C.J. Taft, "Process of Drying Semiconductor Wafers Using Liquid or Supercritical Carbon Dioxide," U.S. Patent 6,398,875 (June 4, 2002).
    • (2002)
    • Cotte, J.M.1    Goldfarb, D.L.2    McCullough, K.J.3    Moreau, W.M.4    Pope, K.R.5    Simons, J.P.6    Taft, C.J.7
  • 40
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    • "Process of Cleaning Semiconductor Processing, Handling, and Manufacturing Equip ment," U.S. Patent 6,454,869 (September 24)
    • J.M. Cotte, D.L. Goldfarb, K.J. McCullough, W.M. Moreau, K.R. Pope, J.P. Simons, and C.J. Taft, "Process of Cleaning Semiconductor Processing, Handling, and Manufacturing Equip ment," U.S. Patent 6,454,869 (September 24, 2002).
    • (2002)
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  • 65
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.