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Volumn 15, Issue 3, 2002, Pages 381-388
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Supercritical drying for nanostructure fabrication
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Author keywords
[No Author keywords available]
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Indexed keywords
CARBON DIOXIDE;
SILICON;
SURFACTANT;
WATER;
ARTICLE;
DENSITY;
DESICCATION;
GAS;
LIQUID;
NANOTECHNOLOGY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR;
SUPERCRITICAL DRYING;
SUPERCRITICAL FLUID;
SURFACE TENSION;
TEMPERATURE;
TIME;
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EID: 0036368792
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.15.381 Document Type: Article |
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Times cited : (32)
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References (11)
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