The impact of supercritical fluoro-compounds on lithography use

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 4 A, 2004, Pages

  Namatsu, Hideo ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

Advanced lithography; Fluoro compounds; Resist; Supercritical drying; Supercritical fluid

Indexed keywords

ANTIREFLECTION COATINGS; ASPECT RATIO; ATMOSPHERIC PRESSURE; CARBON DIOXIDE; DENSITY (SPECIFIC GRAVITY); DRYING; ETHANE; LITHOGRAPHY; SUPERFLUID HELIUM;

ADVANCED LITHOGRAPHY; FLUORO-COMPOUNDS; RESISTS; SUPERCRITICAL RESIST DRYING (SRD);

FLUORINE COMPOUNDS;

EID: 2942536616     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.43.l456     Document Type: Article

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