Low energy electron beam microcolumn lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 962-967

  Kim, Ho Seob ^a,b   Kim, Young Chul ^a   Kim, Dae Wook ^a   Ahn, Seung Joon ^a   Jang, Yong ^a   Kim, Hyung Woo ^a   Seong, Do Jin ^a   Park, Kyoung Wan ^b   Park, Seong Soon ^b   Kim, Byung Jin ^b  

^a SunMoon University   (South Korea)

^b CEBT Co Ltd   (South Korea)

Author keywords

Low energy electron beam; Maskless e beam lithography; Microcolumn

Indexed keywords

ELECTRON ENERGY LEVELS; LITHOGRAPHY; MASKS; MONOLITHIC INTEGRATED CIRCUITS; SILICON WAFERS; THROUGHPUT;

ARRAYED MICROCOLUMN STRUCTURES; LOW ENERGY ELECTRON BEAMS; MASK-LESS LITHOGRAPHY; MASKLESS E-BEAM LITHOGRAPHY;

ELECTRON BEAMS;

EID: 33646507088     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.099     Document Type: Article

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