SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3986-3989

High-beam-current microcolumns with large apertures

(7) Park, Sung Soon a Kim, Dae Wook a Ahn, Seungjoon a Kim, Young Chul a Choi, Sang Kook b Kim, Dae Yong b Kim, Ho Seob a

a SunMoon University (South Korea)

b Electronics and Telecommunications Research Institute (ETRI) (South Korea)

Author keywords

Aperture; Beam energy; Current; Microcolumn

Indexed keywords

APERTURES; BEAM ENERGY; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MICROCOLUMNS;

CARBON NANOTUBES; ELECTRODES; ELECTRON BEAM LITHOGRAPHY; MICROLENSES; OPTICAL INSTRUMENT LENSES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICES; THROUGHPUT; TRANSMISSION ELECTRON MICROSCOPY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 4444331581 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.43.3986 Document Type: Conference Paper

Times cited : (13)

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