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Volumn 200, Issue 14-15, 2006, Pages 4345-4354

A comprehensive model of stress generation and relief processes in thin films deposited with energetic ions

Author keywords

Annealing; Ion assisted deposition; Ion energy; Ion implantation; Model; Stress generation; Stress relief

Indexed keywords

ANNEALING; CHEMICAL BONDS; COATINGS; COMPUTER SIMULATION; DEPOSITION; ION BOMBARDMENT; ION IMPLANTATION; STRESS RELIEF; THIN FILMS;

EID: 33644678557     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.161     Document Type: Article
Times cited : (125)

References (36)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.