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Volumn 200, Issue 14-15, 2006, Pages 4345-4354
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A comprehensive model of stress generation and relief processes in thin films deposited with energetic ions
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Author keywords
Annealing; Ion assisted deposition; Ion energy; Ion implantation; Model; Stress generation; Stress relief
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Indexed keywords
ANNEALING;
CHEMICAL BONDS;
COATINGS;
COMPUTER SIMULATION;
DEPOSITION;
ION BOMBARDMENT;
ION IMPLANTATION;
STRESS RELIEF;
THIN FILMS;
ION ASSISTED DEPOSITION;
ION ENERGY;
STRESS GENERATION;
TENSILE STRESS;
ANNEALING;
CHEMICAL BONDS;
COATINGS;
COMPUTER SIMULATION;
DEPOSITION;
ION BOMBARDMENT;
ION IMPLANTATION;
STRESS RELIEF;
TENSILE STRESS;
THIN FILMS;
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EID: 33644678557
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.02.161 Document Type: Article |
Times cited : (125)
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References (36)
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