Voltage dependence of cluster size in carbon films using plasma immersion ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 741-744

  McKenzie, D R ^a   Tarrant, R N ^a   Bilek, M M M ^a   Pearce, G ^a   Marks, N A ^a   McCulloch, D G ^b   Lim, S H N ^b  

^a UNIVERSITY OF SYDNEY   (Australia)

^b RMIT UNIVERSITY   (Australia)

Author keywords

Carbon; Cathodic arc; Cluster size; Plasma immersion ion implantation; Raman spectroscopy

Indexed keywords

CATHODES; ELECTRIC POTENTIAL; ION IMPLANTATION; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; THIN FILMS;

CATHODIC ARC;

CARBON;

EID: 0038075083     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00831-0     Document Type: Conference Paper

References (4)

1. M.M.M. Bilek, et al., IEEE Trans. in Plasma Sci., Proceedings 20th ISDEIV 1-5 July 2002, Tours, France, Cat. No. 02CH37331, IEEE, Piscataway, NJ, USA, p. 95.
2. Ferrari A.C., Robertson J. Phys. Rev. B Condens. Matter. 61:2000;14095.
3. Ferrari A.C., Robertson J. Phys. Rev. B. 63:2001;121405(R).
4. Marks N.A. Phys. Rev. B. 63:2000;035401. [blank_line]