Stress relief of tetrahedral amorphous carbon films by post-deposition thermal annealing

Surface and Coatings Technology

Volumn 120-121, Issue , 1999, Pages 448-452

  Tay, B K ^a   Shi, X ^a   Liu, E ^a   Lau, S P ^a   Cheah, L K ^a   Sun, Z ^a   Shi, J ^a  

^a Sch Elec Electron Eng   (Singapore)

Author keywords

Amorphous carbon; Cathodic arc; Raman spectroscopy; Stress relief

Indexed keywords

COATING; SPECTROSCOPY; STRESS RELIEF; VACUUM DEPOSITION;

EID: 0033509536     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00465-X     Document Type: Conference Paper

References (20)

1. Martin P.J., Filipczuk S.W., Netterfield R.P., Field J.S., Whitnall D.F., McKenzie D.R. J. Mater. Sci. Lett. 7:1988;410.
2. Martin P.J., Netterfield R.P., Kinder T.J., Descotes L. Surf. Coat. Technol. 49:1991;239.
3. McKenzie D.R., Muller D., Pailthorpe B.A. Phys. Rev. Lett. 67:1991;773.
4. Falabella S., Boercker D.B., Sanders D.M. Thin Film Solids. 236:1993;82.
5. Fallon P.J., Veerasamy V.S., Davis C.A., Robertson J., Amaratunga G.A.J., Milne W.L., Koskinen J. Phys. Rev. B. 48:1993;4777.
6. Shi X., Tay B.K., Tan H.S., Tu Y.Q., Silva S.R.P., Milne W.L. J. Appl. Phys. 79:(9):1996;7239.
7. Tay B.K., Shi X., Tan H.S., Yang H.S., Sun Z. Surf. Coat. Technol. 105:1998;155.
8. Chhowalla M., Yin Y., Amaratunga G.A.I., McKenzie D.R., Faueheim T. Appl. Phys. Lett. 69:1996;2344.
9. Friedmann T.A., Sullivan J.P., Knapp J.A., Tallant D.R., Follstaedt D.M. Appl. Phys. Lett. 71:1997;3820.
10. Grill A., Patel V., Meyerson B.S. J. Mater. Res. 5:(11):1990;2531.
11. Shi X., Flynn D., Tay B.K., Tan H.S. Filtered Cathodic Arc Source PCT/GB96/00389, 20 February. 1995.
12. Shi X., Fulton M., Flynn D., Tan H.S. Deposition Apparatus, PCT/GB96/00390, 20 February. 1995.
13. Stoney G.G. Proc. R. Soc. Lond. 82:1909;172.
14. Forouhi A.R., Bloomer I. Handbook of Optical Constants of Solids II. 1991;Academic Press, New York. Chapter 151.
15. Alterovitz S.A., Savvides N., Smith F.W., Woollam J.A. Handbook of Optical Constants of Solids II. 1991;Academic Press, New York.
16. Roberston J., O'Reilly E.P. Phys. Rev. B. 35:1987;2946.
17. Tay B.K., Chua D. Surf. Interf. Anal. J. 27:1999;. in press.
18. Ohring M. The Material Science of Thin Films. 1992;Academic Press, New York.
19. Hirvonen J.P., Koskinen J. J. Appl. Phys. 81:1997;7248.
20. Reinke P., Oelhafen P. J. Appl. Phys. 81:1997;2396.