SCOPUS 정보 검색 플랫폼

Volumn 9, Issue 3-6, 2000, Pages 680-684

Comparative study of anneal-induced modifications of amorphous carbon films deposited by dc magnetron sputtering at different argon plasma pressures

(6) Jacobsohn, L G a Prioli, R a Freire Jr , F L a Mariotto, G b Lacerda, M M c Chung, Y W c

a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO (Brazil)

b UNIVERSITY OF TRENTO (Italy)

c Northwestern University (United States)

Author keywords

Amorphous carbon; Annealing; Film; Mechanics; Structure; Tribology

Indexed keywords

CARBON FILM; DIAMOND LIKE CARBON; FILM; HARDNESS; MAGNETRON; POLYMER; TEMPERATURE;

ANNEALING; CARBON; COMPRESSIVE STRESS; FRICTION; HARDNESS; MAGNETRON SPUTTERING; RELAXATION PROCESSES; RESIDUAL STRESSES; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TRIBOLOGY;

DIAMOND-LIKE CARBON (DLC) FILMS;

AMORPHOUS FILMS;

ANNEALING; CARBON; FILM; SPUTTERING; TRIBOLOGY;

EID: 0034089607 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(99)00341-6 Document Type: Conference Paper

Times cited : (31)

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