Carbon nanostructures by Hot Filament Chemical Vapor Deposition: Growth, properties, applications

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 8-14

  Bonard, Jean Marc ^a  

^a Rolex SA   (Switzerland)

Author keywords

Carbon nanotubes; Chemical Vapor Deposition; Field emission

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; FILAMENTS (LAMP); GROWTH (MATERIALS); SYNTHESIS (CHEMICAL);

CARBON NANOSTRUCTURES; FIELD EMISSION; GRAPHITIC STRUCTURES; HOT-FILAMENT CVD (HF-CVD);

CARBON NANOTUBES;

EID: 32644432386     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.10.054     Document Type: Conference Paper

References (73)

1. H. Lu, and D. Dandy Diamond Chemical Vapor Deposition 1995 Noyes Publications New York
2. H.W. Kroto, J.R. Heath, S.C. OBrien, R.F. Curl, and R.E. Smalley Nature 318 1985 162
3. W. Kratschmer, L.R. Lamb, K. Fostiropoulos, and D. Huffman Nature 347 1990 354
4. S. Iijima Nature 354 1991 56
5. M.S. Dresselhaus, G. Dresselhaus, K. Sugihara, I.L. Spain, and H.A. Goldberg Graphite Fibers and Filaments 1988 Springer Berlin
6. M.S. Kim, N.M. Rodriguez, and R.T.K. Baker J. Catal. 131 1991 60
7. P. Bachmann, and W. van Enckevort Diamond Relat. Mater. 1 1992 1021
8. Diaccon, http://www.diaccon.de.
9. 3, http://www.sp3inc.com.
10. A. Grill Diamond Relat. Mater. 8 1999 428
11. H. Yokomichi, A. Masuda, and N. Kishimoto Thin Solid Films 395 2001 249
12. H. Nakayama, K. Takatsuji, S. Moriwaki, K. Murakami, K. Mizoguchi, M. Nakayama, and Y. Miura Thin Solid Films 430 2003 309
13. K.K.S. Lau, Y. Mao, H.G. Pryce Lewis, S.K. Murthy, B.D. Olsen, L.S. Loo, and K.K. Gleason Thin Solid Films 501 2006 211 (this issue)
14. J. Chan, K. Gleason, Thin Solid Films HWCVD-3 proceedings, (presented at the HWCVD-3 conference, Utrecht, the Netherlands, 2004).
15. G.A. Zaharias, H.H. Shi, and S.F. Bent Thin Solid Films 501 2006 341 (this issue)
16. H.P. Lewis, J. Caulfield, and K. Gleason Langmuir 17 2001 7652
17. K. Lau, J. Caulfield, and K. Gleason Chem. Mater. 13 2000 3032
18. K. Lau, H.P. Lewis, S. Limb, M. Kwan, and K. Gleason Thin Solid Films 395 2001 288
19. K. Lau, J. Bico, K. Teo, M. Chhowalla, G. Amaratunga, W.I. Milne, G. McKinley, and K. Gleason Nano Lett. 3 2003 1701
20. J.-M. Bonard, P. Chauvin, and C. Klinke Nano Lett. 2 2002 665
21. M. Chhowalla, K.B.K. Teo, C. Ducati, N.L. Rupesinghe, G.A.J. Amaratunga, A.C. Ferrari, D. Roy, J. Robertson, and W.I. Milne J. Appl. Phys. 90 2001 5308
22. H. Kind, J.M. Bonard, C. Emmenegger, L.O. Nilsson, K. Hernadi, E.M. Schaller, L. Schlapbach, L. Forro, and K. Kern Adv. Mater. 11 1999 1285
23. J.-M. Bonard, M. Croci, O. Noury, T. Stöckli, and A. Chatelain Appl. Phys. Lett. 81 2002 2836
24. D.B. Geohegan, A.A. Puretzky, I.N. Ivanov, S. Jesse, and G. Eres Appl. Phys. Lett. 83 2003 1851
25. A.M. Bonnot, M.N. Semeria, J.F. Boronat, T. Fournier, and L. Pontonnier Diamond Relat. Mater. 9 2000 852
26. Z.F. Ren, Z.P. Huang, D.Z. Wang, J.G. Wen, J.W. Xu, J.H. Wang, L.E. Calvet, J. Chen, J.F. Klemic, and M.A. Reed Appl. Phys. Lett. 75 8 1999 1086
27. S. Fan, M.G. Chapline, N.R. Franklin, T.W. Tombler, A.M. Cassell, and H. Dai Science 283 1999 512
28. F. Ren, Z.P. Huang, J.W. Xu, J.H. Wang, P. Bush, M.P. Siegal, and P.N. Provencio Science 282 1998 1105
29. A.H. Mahan, J.L. Alleman, M.J. Heben, P.A. Parilla, K.M. Jones, and A.C. Dillon Appl. Phys. Lett. 81 2002 4061
30. A.C. Dillon, A.H. Mahan, P.A. Parilla, J.L. Alleman, M.J. Heben, K.M. Jones, and K.E.H. Gilbert Nano Lett. 3 2003 1425
31. J. Kong, H.T. Soh, A.M. Cassell, C.F. Quate, and H. Dai Nature 395 6705 1998 878
32. K.B.K. Teo, M. Chhowalla, G.A.J. Amaratunga, and W.I. Milne Appl. Phys. Lett. 79 2001 1534
33. A.M. Cassell, N.R. Franklin, T.W. Tombler, E.M. Chan, J. Han, and H. Dai J. Am. Chem. Soc. 121 1999 7975
34. H. Kind, J.-M. Bonard, L. Forró, K. Kern, K. Hernadi, L.-O. Nilsson, and L. Schlapbach Langmuir 16 2000 6877
35. Y. Zhang, Y. Li, W. Kim, D. Wang, and H. Dai Appl. Phys., A 74 2002 325
36. J. Kong, C. Zhou, A. Morpurgo, H.T. Soh, C.F. Quate, C. Marcus, and H. Dai Appl. Phys., A 69 1999 305
37. L. Marty, V. Bouchiat, A.M. Bonnot, M. Chaumont, T. Fournier, S. Decossas, and S. Roche Microelectron. Eng. 61-62 2002 485
38. L. Marty, V. Bouchiat, C. Naud, M. Chaumont, T. Fournier, and A.M. Bonnot Nano Lett. 3 2003 1115
39. A. Iaia, L. Marty, C. Naud, V. Bouchiat, A. Loiseau, E. Di Muoio, T. Fournier, and A.M. Bonnot Thin Solid Films HWCVD-3 proceedings 501 2006 221 (this issue)
40. J. Li, C. Papadopoulos, J.M. Xu, and M. Moskovits Appl. Phys. Lett. 75 1999 367
41. K.-H. Park, J.H. Yim, S. Lee, and K.H. Koh Thin Solid Films HWCVD-3 proceedings 501 2006 233 (this issue)
42. J.-M. Bonard, N. Weiss, H. Kind, T. Stöckli, L. Forró, K. Kern, and A. Châtelain Adv. Mater. 13 2001 184
43. J.-M. Bonard, K.A. Dean, B.F. Coll, and C. Klinke Phys. Rev., B 67 2003 115406
44. F. Lenormand, Thin Solid Films HWCVD-3 proceedings, (presented at the HWCVD-3 conference, Utrecht, the Netherlands, 2004).
45. B. Cruden, A. Cassell, Q. Ye, and M. Meyyappan J. Appl. Phys. 94 2003 4070
46. The growth of SWNTs by PE-CVD has been recently demonstrated, although the PE-CVD reactors seem to differ markedly from the ones currently used to grow MWNTs. See Y. Li, D. Mann, M. Rolandi, W. Kim, A. Ural, S. Hung, A. Javey, J. Cao, D. Wang, E. Yenilmez, Q. Wang, J.F. Gibbons, Y. Nishi, H. Dai, Nano Letters 4 (2004) 317;
47. G. Zhong, T. Iawsaki, K. Honda, Y. Furukawa, I. Ohdomari, H. Karawada, Jap. J. Appl. Phys. 44 (2005) 1558.
48. M. Werner, and R. Locher Rep. Prog. Phys. 61 1999 1665
49. R.H. Baughman, A.A. Zakhidov, and W.A. de Heer Science 297 2002 787
50. M.W. Geis, N.N. Efremow, J.D. Woodhouse, M.D. McAleese, M. Marchywka, D.G. Socker, and J.F. Hochedez IEEE Electron Dev. Lett. 1991 456
51. L.A. Chernozatonskii, Y.V. Gulyaev, Z.Y. Kosakovskaya, N.I. Sinitsyn, G.V. Torgashov, F.Z. Yu, E.A. Fedorov, and V.P. Val'chuk Chem. Phys. Lett. 233 1995 63
52. A.G. Rinzler, J.H. Hafner, P. Nikolaev, L. Lou, S.G. Kim, D. Tomanek, P. Nordlander, D.T. Colbert, and R.E. Smalley Science 269 1995 1550
53. W.A.D. Heer, A. Châtelain, and D. Ugarte Science 270 1995 1179
54. J.-M. Bonard, M. Croci, C. Klinke, R. Kurt, O. Noury, and N. Weiss Carbon 40 2002 1715
55. J.-M. Bonard, K.A. Dean, B.F. Coll, and C. Klinke Phys. Rev. Lett. 89 2003 197602
56. N. de Jonge, Y. Lamy, K. Schoots, and T. Oosterkamp Nature 420 2002 393
57. W.I. Milne, K.B.K. Teo, G.A.J. Amaratunga, P. Legagneux, L. Gangloff, J.-P. Schnell, V. Semet, V.T. Binh, and O. Groening J. Mater. Chem. 14 2004 933
58. G. Pirio, P. Legagneux, D. Pribat, K. Teo, M. Chhowalla, G. Amaratunga, and W. Milne Nanotechnology 13 2001 1
59. H. Sugie, M. Tanemura, V. Filip, K. Iwata, K. Takahashi, and F. Okuyama Appl. Phys. Lett. 78 2001 2578
60. G.Z. Yue, Q. Qiu, B. Gao, Y. Cheng, J. Zhang, H. Shimoda, S. Chang, J.P. Lu, and O. Zhou Appl. Phys. Lett. 81 2002 355
61. Applied Nanotech International. See also http://www.oxinst.com/ANLNWP390. htm.
62. A. Talin, K. Dean, and J. Jaskie Solid-State Electron. 45 2001 963
63. M. Croci, I. Arfaoui, T. Stöckli, A. Chatelain, and J.-M. Bonard Microelectron. J. 35 2004 329
64. L. Nilsson, O. Groening, P. Groening, O. Kuettel, and L. Schlapbach J. Appl. Phys. 90 2001 768
65. J. Dijon, A. Fournier, B. Montmayeul, D. Zanghi, B. Coll, J.-M. Bonard, and A.-M. Bonnot Eurodisplay 2002 proceedings LN-2 2002 821
66. S.J. Tans, R.M. Verschueren, and C. Dekker Nature 393 1998 49
67. R. Martel, T. Schmidt, H.R. Shea, T. Hertel, and P. Avouris Appl. Phys. Lett. 73 1998 2447
68. X. Cui, M. Freitag, R. Martel, L. Brus, and P. Avouris Nano Lett. 3 2003 783
69. V. Derycke, R. Martel, J. Appenzeller, and P. Avouris Nano Lett. 1 2001 453
70. M. Stoneham Nat. Mater. 3 2004 3
71. J. Kong, N.R. Franklin, C. Zhou, M.G. Chapline, S. Peng, K. Cho, and H. Dai Science 287 2000 622
72. J. Li, Y. Lu, Q. Ye, M. Cinke, J. Han, and M. Meyyappan Nano Lett. 3 2003 329
73. Y.-C. Tseng, P. Xuan, A. Javey, R. Malloy, Q. Wang, J. Bokor, and H. Dai Nano Lett. 4 2004 123