-
2
-
-
0001692228
-
-
apl APPLAB 0003-6951
-
C. A. Bower, O. Zhou, Z. Wei, D. J. Werder, and J. Sungho, Appl. Phys. Lett. 77, 2767 (2000). apl APPLAB 0003-6951
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 2767
-
-
Bower, C.A.1
Zhou, O.2
Wei, Z.3
Werder, D.J.4
Sungho, J.5
-
3
-
-
0035890401
-
-
jaJAPIAU 0021-8979
-
M. Chhowalla, K. B. K. Teo, C. Ducati, N. L. Rupesinghe, G. A. J. Amaratunga, A. C. Ferrari, D. Roy, J. Robertson, and W. I. Milne, J. Appl. Phys. 90, 5308 (2001). jap JAPIAU 0021-8979
-
(2001)
J. Appl. Phys.
, vol.90
, pp. 5308
-
-
Chhowalla, M.1
Teo, K.B.K.2
Ducati, C.3
Rupesinghe, N.L.4
Amaratunga, G.A.J.5
Ferrari, A.C.6
Roy, D.7
Robertson, J.8
Milne, W.I.9
-
4
-
-
0345975532
-
-
apl APPLAB 0003-6951
-
K. B. K. Teo, M. Chhowalla, G. A. J. Amaratunga, and W. I. Milne, Appl. Phys. Lett. 79, 1534 (2001). apl APPLAB 0003-6951
-
(2001)
Appl. Phys. Lett.
, vol.79
, pp. 1534
-
-
Teo, K.B.K.1
Chhowalla, M.2
Amaratunga, G.A.J.3
Milne, W.I.4
-
5
-
-
0002641858
-
-
cvd CVDEFX 0948-1907
-
M. Croci, J.-M. Bonard, O. Noury, T. Stöckli, and A. Chatelain, Chem. Vap. Deposition 8, 89 (2002). cvd CVDEFX 0948-1907
-
(2002)
Chem. Vap. Deposition
, vol.8
, pp. 89
-
-
Croci, M.1
Bonard, J.-M.2
Noury, O.3
Stöckli, T.4
Chatelain, A.5
-
7
-
-
79957957607
-
-
sci SCIEAS 0036-8075
-
A. Bachtold, P. Hadley, T. Nakanishi, and C. Dekker, Science 292, 778 (2001). sci SCIEAS 0036-8075
-
(2001)
Science
, vol.292
, pp. 778
-
-
Bachtold, A.1
Hadley, P.2
Nakanishi, T.3
Dekker, C.4
-
8
-
-
0035878957
-
-
jaJAPIAU 0021-8979
-
L. Nilsson, O. Groening, P. Groening, O. Kuettel, and L. Schlapbach, J. Appl. Phys. 90, 768 (2001). jap JAPIAU 0021-8979
-
(2001)
J. Appl. Phys.
, vol.90
, pp. 768
-
-
Nilsson, L.1
Groening, O.2
Groening, P.3
Kuettel, O.4
Schlapbach, L.5
-
10
-
-
0028320029
-
-
sus SUSCAS 0039-6028
-
R. Gomer, Surf. Sci. 299, 129 (1994). sus SUSCAS 0039-6028
-
(1994)
Surf. Sci.
, vol.299
, pp. 129
-
-
Gomer, R.1
-
11
-
-
0035971787
-
-
apl APPLAB 0003-6951
-
J.-M. Bonard, T. Stöckli, O. Noury, and A. Chatelain, Appl. Phys. Lett. 78, 2775 (2001). apl APPLAB 0003-6951
-
(2001)
Appl. Phys. Lett.
, vol.78
, pp. 2775
-
-
Bonard, J.-M.1
Stöckli, T.2
Noury, O.3
Chatelain, A.4
-
13
-
-
85006928919
-
-
NanoLight International Ltd., patent pending
-
NanoLight International Ltd., patent pending.
-
-
-
-
14
-
-
85006865646
-
-
2=21mm are the radii of the cathode and of the anode, respectively. 11
-
2=21mm are the radii of the cathode and of the anode, respectively. 11
-
-
-
-
16
-
-
0032101980
-
-
ult ULTRD6 0304-3991
-
Y. Saito, K. Hamaguchi, K. Hata, K. Tohji, A. Kasuya, Y. Nishina, K. Uchida, Y. Tasaka, F. Ikazaki, and M. Yumura, Ultramicroscopy 73, 1 (1998). ult ULTRD6 0304-3991
-
(1998)
Ultramicroscopy
, vol.73
, pp. 1
-
-
Saito, Y.1
Hamaguchi, K.2
Hata, K.3
Tohji, K.4
Kasuya, A.5
Nishina, Y.6
Uchida, K.7
Tasaka, Y.8
Ikazaki, F.9
Yumura, M.10
-
18
-
-
49549165973
-
-
jtl JCTLA5 0021-9517
-
R. T. K. Baker, P. S. Harris, R. B. Thomas, and R. J. Waite, J. Catal. 30, 86 (1973). jtl JCTLA5 0021-9517
-
(1973)
J. Catal.
, vol.30
, pp. 86
-
-
Baker, R.T.K.1
Harris, P.S.2
Thomas, R.B.3
Waite, R.J.4
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