In situ growth rate measurements and length control during chemical vapor deposition of vertically aligned multiwall carbon nanotubes

Applied Physics Letters

Volumn 83, Issue 9, 2003, Pages 1851-1853

  Geohegan, D B ^b   Puretzky, A A ^b   Ivanov, I N ^b   Jesse, S ^b   Eres, G ^b   Howe, J Y ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FABRY-PEROT INTERFEROMETERS; LASER BEAMS; REACTION KINETICS; SILICON; SUBSTRATES;

LENGTH CONTROL;

CARBON NANOTUBES;

EID: 0141857665     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1605793     Document Type: Article

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