메뉴 건너뛰기




Volumn 24, Issue 1, 2006, Pages 473-477

Nonconventional flash annealing on shallow indium implants in silicon

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC CONCENTRATION; DOPANT ACTIVATION; FLASH ANNEALING; INDIUM DIFFUSION;

EID: 31544450305     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2132321     Document Type: Article
Times cited : (5)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.