Enhanced electrical activation of indium coimplanted with carbon in a silicon substrate

Journal of Applied Physics

Volumn 86, Issue 10, 1999, Pages 5909-5911

  Boudinov, H ^b   De Souza, J P ^b   Saul, C K ^a,b  

^a FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013224560     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371611     Document Type: Article

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