Hydrogenated-amorphous carbon nitride films formed from the dissociative excitation reaction of CH3CN with the microwave-discharge flow of Ar: Correlation of the [N]/([N]+[C]) ratio with the relative number densities of the CH(A2Δ) and CN(B2Σ+) states

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 487-493

  Ito, Haruhiko ^a   Miki, Hiroshi ^a   Namiki, Kei Ichi C ^a   Ito, Noriko ^a   Saitoh, Hidetoshi ^a   Suzuki, Tsuneo ^a   Yatsui, Kiyoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NITRIDE; CHARGE TRANSFER; CONCENTRATION (PROCESS); ELECTRIC DISCHARGES; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; ENERGY TRANSFER; HYDROGENATION; INFRARED RADIATION; MOLECULAR STRUCTURE; RAMAN SPECTROSCOPY; SYNTHESIS (CHEMICAL); WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

DESICCATED SYSTEMS; DISCHARGE FLOW; ION-ELECTRON RECOMBINATION; PRECURSORS;

AMORPHOUS FILMS;

EID: 3142583522     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1690250     Document Type: Article

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