Dissociative excitation reaction of CH3CN with the discharge flow of Ar: Prediction of the [N]/([N]+[C]) ratio of hydrogenated amorphous carbon nitride films in the desiccated system

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 A, 2003, Pages 3684-3685

  Ito, Haruhiko ^a   Miki, Hiroshi ^a   Namiki, Ken Ichi C ^a   Ito, Noriko ^a   Saitoh, Hidetoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

CH radical; CH3CN; CN radical; Emission spectroscopy; Hydrogenated amorphous carbon nitride

Indexed keywords

ARGON; CARBON NITRIDE; DISSOCIATION; ELECTRON TRANSITIONS; EMISSION SPECTROSCOPY; FREE RADICAL REACTIONS; HYDROGENATION; MOLECULES; PLASMAS; PRESSURE; SUBSTRATES; WATER;

DESICCATED SYSTEM; DISSOCIATIVE EXCITATION REACTION; HYDROGENATED AMORPHOUS CARBON NITRIDE; MICROWAVE DISCHARGE FLOW;

AMORPHOUS FILMS;

EID: 0042381553     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3684     Document Type: Article

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