Ion beam sputter deposition of soft x-ray MoSi multilayer mirrors

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 3, 2005, Pages 959-965

  Schubert, E ^a   Frost, F ^a   Ziberi, B ^a   Wagner, G ^b   Neumann, H ^a   Rauschenbach, B ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; ION BEAMS; MULTILAYERS; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

GLANCING ANGLE; MULTILAYER MIRRORS; PEAK WAVELENGTH; SPECTRAL REGION;

MOLYBDENUM COMPOUNDS;

EID: 31344441446     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1924610     Document Type: Article

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