Formation of Mo 5Si 3 phase in Mo/Si multilayers

Journal of Applied Physics

Volumn 92, Issue 9, 2002, Pages 5119-5126

  Srivastava, A K ^a   Tripathi, Pragya ^a   Nayak, M ^a   Lodha, G S ^a   Nandedkar, R V ^a  

^a RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL TRANSMISSION ELECTRON MICROSCOPE; COMPOSITIONAL ANALYSIS; ELECTRON BEAM EVAPORATION; ENERGY DISPERSIVE X-RAY; HIGH TEMPERATURE; IN-SITU; MO/SI MULTILAYER; SELECTED AREA DIFFRACTION;

ELECTRON BEAMS; MULTILAYERS; SILICIDES; TRANSMISSION ELECTRON MICROSCOPY;

SILICON;

EID: 18744374688     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1512971     Document Type: Article

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