Generation of a pulsed ion beam with a tuned electronic beam switch

Plasma Sources Science and Technology

Volumn 12, Issue 3, 2003, Pages 489-494

  Dienelt, J ^a   Zimmer, K ^a   Scholze, F ^a   Dathe, B ^a   Neumann, H ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRIC VARIABLES MEASUREMENT; ELECTRON BEAMS; ION SOURCES; SEMICONDUCTING GALLIUM ARSENIDE; SPUTTER DEPOSITION; SWITCHING;

ELECTRONIC BEAM SWITCH; ION CURRENT DENSITY; PULSED ION BEAM;

ION BEAMS;

EID: 0042364994     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/12/3/326     Document Type: Article

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