High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 389-399

  Backer, Hans ^a   Sobel, Frank ^a   Aschke, Lutz ^a   Renno, Markus ^a   Krieger, Jürgen ^a   Buttgereit, Ute ^a   Heß, Günter ^a   Lenzen, Frank ^a   Knapp, Konrad ^a   Yulin, Sergey ^b   Feigl, Torsten ^b   Kuhlmann, Thomas ^b   Kaiser, Norbert ^b  

^a Schott Lithotec AG   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Defect inspection; EUV; IBD; Mo Si; Multilayer mirrors; NGL

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION BEAMS; SPUTTER DEPOSITION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

LASER SCANNERS;

MASKS;

EID: 0037627730     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467578     Document Type: Conference Paper

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