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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 274-285

Multi-component EUV multilayer mirrors

(5) Braun, Stefan a Foltyn, Thomas a Van Loyen, Ludwig a Moss, Matthew a Leson, Andreas a

a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS (Germany)

Author keywords

Ag; B4C; Barrier; C; EUV; Mirror; Mo; Multilayer; Optics; Ru; Si; X ray

Indexed keywords

HIGH RESOLUTION ELECTRON MICROSCOPY; LITHOGRAPHY; MICROSTRUCTURE; MOLYBDENUM; MULTILAYERS; REFLECTION; REFLECTOMETERS; SILICON; SPUTTER DEPOSITION; STRESSES; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

EXTREME ULTRAVIOLET LITHOGRAPHY; EXTREME ULTRAVIOLET REFLECTOMETRY;

MIRRORS;

EID: 0141608740 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.484984 Document Type: Conference Paper

Times cited : (23)

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