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Volumn 72, Issue 1, 2001, Pages 121-124

Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000602536     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390000723     Document Type: Article
Times cited : (66)

References (15)
  • 14
    • 0004055759 scopus 로고
    • SPIE - The International Society for Optical Engineering, Bellingham, Washington
    • E. Spiller: In: Soft X-ray Optics (SPIE - The International Society for Optical Engineering, Bellingham, Washington 1994) p. 203
    • (1994) Soft X-ray Optics , pp. 203
    • Spiller, E.1
  • 15
    • 85037266377 scopus 로고    scopus 로고
    • Stress reduction of Mo/Si multilayers deposited by ion-beam sputtering
    • Santa Clara, Calif. SPIE, Tokyo, Japan
    • M. Shiraishi, W. Ishiyama, T. Oshino, K. Murakam : Stress reduction of Mo/Si multilayers deposited by ion-beam sputtering. In Microlithography 2000 Proceedings, Santa Clara, Calif. (SPIE, Tokyo, Japan 2000) p. 107
    • (2000) Microlithography 2000 Proceedings , pp. 107
    • Shiraishi, M.1    Ishiyama, W.2    Oshino, T.3    Murakam, K.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.