Exploiting volatile lead compounds as precursors for the atomic layer deposition of lead dioxide thin films

Thin Solid Films

Volumn 497, Issue 1-2, 2006, Pages 77-82

  Harjuoja, Jenni ^a   Putkonen, Matti ^a   Niinistö, Lauri ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

Atomic layer deposition; Deposition process; Lead dioxide; Surface morphology

Indexed keywords

ANNEALING; DEPOSITION; FILM GROWTH; MORPHOLOGY; SILICON; SURFACES; THIN FILMS; X RAY DIFFRACTION;

ATOMIC LAYER DEPOSITION; DEPOSITION PROCESS; LEAD DIOXIDE; OXYGEN SOURCES;

LEAD COMPOUNDS;

EID: 30344433453     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.188     Document Type: Article

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