Characterization of lead oxide thin films produced by chemical vapor deposition

Journal of the American Ceramic Society

Volumn 81, Issue 4, 1998, Pages 988-996

  Madsen, Lynnette D ^a,c   Weaver, Louise ^b  

^a MCMASTER UNIVERSITY   (Canada)

^b QUEEN S UNIVERSITY   (Canada)

^c LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AUGER ELECTRON SPECTROSCOPY; CRYSTAL GROWTH; ELECTRON DIFFRACTION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; OXIDATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; THIN FILMS; X RAY CRYSTALLOGRAPHY;

LEAD OXIDE;

LEAD COMPOUNDS;

EID: 0032046732     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1998.tb02436.x     Document Type: Article

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