Low pressure chemical vapor deposition of PbO thin film from lead dichloride

Journal of Materials Science Letters

Volumn 17, Issue 12, 1998, Pages 969-971

  Dai, Guorui ^a   Xu, Jiayue ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL STRUCTURE; FILM PREPARATION; INFRARED SPECTROSCOPY; PRESSURE EFFECTS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

LEAD DICHLORIDE; LEAD MONOXIDE; LOW PRESSURE CHEMICAL VAPOR DEPOSITION;

OXIDES;

EID: 0032083972     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006641429499     Document Type: Article

References (13)

1. S. R. ELLIS, N. A. HAMPSON, M. C. BALL and F. WILKINSON, J. Appl. Electrochem. 16 (1986) 159.
2. V. DANEL and V. PLICHDN, Electrochim. Acta 28 (1983) 781.
3. G. TRINQUIER and R. HOFFMANN, J. Phys. Chem. 88 (1984) 6696.
4. H. UNOKI, K. OKA and A. NAKAMURA, Jpn. J. Appl. Phys. 20 (1981) 2329.
5. S. RADHAKRISHNAN, M. N. KAMALASANAN and P. C. MEHENDRU, J. Mater. Sci. 18 (1983) 1912.
6. Y. OKURI and Y. OGO, Bull. Chem. Soc. Jpn. 55 (1982) 3461.
7. M. YING-REN, J. Appl. Phys. 76 (1994) 2860.
8. J. C. SCHOTTMILLER, Appl. Phys. 37 (1966) 3505.
9. M. TDMPSETT and J. NOBLE, Thin Solid Films 5 (1970) 81.
10. T. B. LIGHT, J. M. ELDRIDGE, J. W. MATTHEWS and J. H. GREINER, J. Appl. Phys. 46 (1975) 1489.
11. M. BALEVA and V. TUNCHEVA, J. Mater. Sci. Lett. 13 (1994) 3.
12. I. BIRSS and M. T. SHEVALIER, J. Electrochem. Soc. 137 (1990) 2643.
13. I. ZHITOMIRSKY, L. GL-OR, A. KOHN and H. W. HENNICKE, J. Mater. Sci. Lett. 14 (1995) 807.