Tuning effect of inert gas mixing on electron energy distribution function in inductively coupled discharges

Plasma Physics and Controlled Fusion

Volumn 48, Issue 1, 2006, Pages 61-70

  Pu, Yi Kang ^a   Guo, Zhi Gang ^a   Aman Ur Rehman, ^a   Yu, Zhen Dong ^a   Ma, Jie ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC EXCITATION; ELECTRON ENERGY LEVELS; INDUCTIVELY COUPLED PLASMA; IONIZATION; MATHEMATICAL MODELS; MIXING;

ELECTRON ENERGY DISTRIBUTION; INELASTIC COLLISIONS; INERT GAS MIXING; LANGMUIR PROBE;

INERT GASES;

EID: 29244451425     PISSN: 07413335     EISSN: 13616587     Source Type: Journal    
DOI: 10.1088/0741-3335/48/1/006     Document Type: Article

References (27)

1. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
2. Godyak V A, Piejak R B and Alexandrovich B M 2002 Plasma Sources Sci. Technol. 11 525
3. Sugai H, Ghanashev I, Hosokawa M, Mizuno K, Nakamura K, Toyoda H and Yamauchi K 2001 Plasma Sources Sci. Technol. 10 378
4. Singh H and Graves D B 2000 J. Appl. Phys. 87 4098
5. Singh H, Coburn J W and Graves D B 2001 J. Vac. Sci. Technol. A 19 718
6. Malyshev M V, Donnelly V M and Samukawa S 1999 J. Appl. Phys. 84 1222
7. Gudmundsson J T, Kimura T and Lieberman M A 1999 Plasma Sources Sci. Technol. 8 22
8. Malyshev M V and Donnelly V M 1999 Phys. Rev. E 60 6016
9. Malyshev M V and Donnelly V M 2000 J. Appl. Phys. 87 1642
10. Singh H and Graves D B 2000 J. Appl. Phys. 88 3889
11. Kimura T and Ohe K 2001 J. Appl. Phys. 89 4240
12. Abdel-Fattah E and Sugai H 2003 Appl. Phys. Lett. 83 1533
13. Seo S H, Hong J I, Bai K H and Chang H Y 1999 Phys. Plasmas 6 614
14. Seo S H, Hong J I and Chang H Y 1999 Appl. Phys. Lett. 74 2776
15. Deegan C M, Goss J P, Vender D and Hopkins M B 1999 Appl. Phys. Lett. 74 1969
16. Seo S H, Hong J I and Chang H Y 2004 J. Appl. Phys. 96 57
17. Chin W C, Kim S S and Chang H Y 2004 Phys. Rev. Lett. 69 16406-1
18. Godyak V A and Alexandrovich B M 2004 Phys. Plasmas 11 3553
19. Bai K H, Hong J I, Chung C W, Kim S S and Chang H Y 2001 Phys. Plasmas 8 3498
20. Pu Y K et al 2002 Pure Appl. Chem. 74 459
21. Bai K H, Lee D S, Chang H Y and Uhm H S 2002 Appl. Phys. Lett. 80 3907
22. Bai K H, You S J, Chang H Y and Uhm H S 2002 Phys. Plasmas 9 2831
23. Ma J and Pu Y K 2003 Phys. Plasmas 10 4118
24. Samukawa S and Nakano T 1999 J. Vac. Sci. Technol. A 17 500
25. Li X, Li L, Xue F H, Oehrlein G S, Yi C W and Anderson H M 2003 J. Vac. Sci. Technol. A 21 1955
26. Kimura T and Ohe K 2000 Japan. J. Appl. Phys. Part 1 39 282
27. Paranjpe A P, McVittie J P and Self S A 1990 J. Appl. Phys. 67 6718