Effects of rare gas dilution for control of dissociation, ionization, and radical density in fluorocarbon ultrahigh-frequency plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 2, 1999, Pages 500-505

  Samukawa, Seiji ^a   Nakano, Toshiki ^b  

^a NEC CORPORATION   (Japan)

^b NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033419642     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581611     Document Type: Article

References (9)

1. H. Itoh et al., J. Phys. D 24, 277 (1991).
2. C. Suzuki, Y. Kawai, K. Sasaki, and K. Kadota, Proceedings of the Third Conference on Reactive Plasmas (The Japan Society of Applied Physics, Nara, Japan, 1997), p. 437.
3. K. Miyata, H. Arai, T. Kuno, M. Hori, and T. Goto, Proceedings of the Third Conference on Reactive Plasmas (The Japan Society of Applied Physics, Nara, Japan, 1997), p. 63.
4. S. Samukawa, Y. Nakagawa, T. Tsukada, H. Ueyama, and K. Shinohara, Jpn. J. Appl. Phys., Part 1 34, 6805 (1995).
5. T. Nakano and H. Sugai, Jpn. J. Appl. Phys., Part 1 31, 2919 (1992).
6. H. Akashi, S. Samukawa, N. Takahashi, and T. Sasaki, Jpn. J. Appl. Phys., Part 2 36, L877 (1997).
7. S. Samukawa and T. Tsukada, Jpn. J. Appl. Phys., Part 1 35, 7647 (1997).
8. M. V. Malyshev, V. M. Donnely, and S. Samukawa, J. Appl. Phys. 84, 1222 (1998).
9. H. Kazumi and K. Tago, Jpn. J. Appl. Phys., Part 1 34, 2125 (1995).