Mechanism of film growth of tellurium by electrochemical deposition in the presence and absence of cadmium ions

Journal of Physical Chemistry B

Volumn 109, Issue 46, 2005, Pages 21779-21787

  Ku, Jie Ren ^a   Vidu, Ruxandra ^a,b   Stroeve, Pieter ^a  

^a University of California Davis   (United States)

^b All Best Materials LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL DEPOSITION; GROWTH MORPHOLOGY; NANOWIRES;

ATOMIC FORCE MICROSCOPY; CADMIUM; DEPOSITION; ELECTROCHEMISTRY; NANOTUBES; SCANNING ELECTRON MICROSCOPY; SURFACE PLASMON RESONANCE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

TELLURIUM;

CADMIUM; GOLD; ION; TELLURIUM;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTROCHEMISTRY; ELECTRODE; KINETICS; METHODOLOGY; PARTICLE SIZE; SENSITIVITY AND SPECIFICITY; SPECTROPHOTOMETRY; SURFACE PLASMON RESONANCE; X RAY;

CADMIUM; ELECTROCHEMISTRY; ELECTRODES; GOLD; IONS; KINETICS; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; PARTICLE SIZE; SENSITIVITY AND SPECIFICITY; SPECTROPHOTOMETRY; SURFACE PLASMON RESONANCE; TELLURIUM; X-RAYS;

EID: 28944451639     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp053833q     Document Type: Article

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