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Volumn 42, Issue 16, 1997, Pages 2455-2464

In situ atomic force microscopy studies of electrodeposition mechanism of cerium oxide films: Nucleation and growth out of a gel mass precursor

Author keywords

Cerium oxide films; Corrosion inhibiting films; Electrochemical nucleation and growth; Gel mass precursor in oxide deposition; In situ atomic force microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CERIUM COMPOUNDS; CORROSION INHIBITORS; CRYSTALLIZATION; ELECTRODEPOSITION; FILM GROWTH; GELS; MASS TRANSFER; NUCLEATION; REACTION KINETICS;

EID: 0031332964     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(96)00433-1     Document Type: Article
Times cited : (70)

References (26)
  • 15
    • 0004276650 scopus 로고
    • ATDSR/TP-88/10. Agency for Toxic Substances, U.S. Public Health Service
    • Toxicological Profile for Chromium, ATDSR/TP-88/10. Agency for Toxic Substances, U.S. Public Health Service (1989).
    • (1989) Toxicological Profile for Chromium
  • 20
    • 0001939252 scopus 로고
    • (Edited by A. J. Bard), Marcel Dekker, New York
    • J. A. Harrison and H. R. Thirsk, in Electroanalytical Chemistry (Edited by A. J. Bard), Vol. 5, p. 67. Marcel Dekker, New York (1971).
    • (1971) Electroanalytical Chemistry , vol.5 , pp. 67
    • Harrison, J.A.1    Thirsk, H.R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.