Epitaxial growth of metals with high Ehrlich-Schwoebel barriers and the effect of surfactants

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 5, 1999, Pages 553-557

  Camarero, J ^a   Cros, V ^a   Capitan M J ^b   Alvarez J ^a,b   Ferrer, S ^b   Nino M A ^a   Prieto, J E ^a   Gomez L ^c   Ferron J ^d   Vazquez De Parga A L ^a   Gallego, J M ^e   De Miguel, J J ^a   Miranda, R ^a  

^a INSTITUTO NICOLÁS CABRERA   (Spain)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^c INSTITUTO DE FÍSICA ROSARIO   (Argentina)

^d UNIVERSIDAD NACIONAL DEL LITORAL   (Argentina)

^e INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; FILM GROWTH; LEAD; METALLIC FILMS; MONOLAYERS; SURFACE ACTIVE AGENTS;

EHRLICH-SCHWOEBEL BARRIERS;

EPITAXIAL GROWTH;

EID: 0033363984     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051469     Document Type: Article

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