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Journal of Applied Physics

Volumn 98, Issue 10, 2005, Pages

Polarization behaviors of (Bi 3.15 Nd 0.85) Ti 3 O 12 thin films deposited by radio-frequency magnetron sputtering

(3) Gao, X S a Xue, J M a Wang, J a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

REMANENT POLARIZATION; SWITCHING CYCLES;

ELECTRIC SPACE CHARGE; MAGNETRON SPUTTERING; POLARIZATION; RAPID THERMAL ANNEALING; REMANENCE; SWITCHING; THIN FILMS;

FERROELECTRIC MATERIALS;

EID: 28644437162 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2131192 Document Type: Article

Times cited : (8)

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