Fabrication of M3+-substituted and M3+/V 5+-cosubstituted bismuth titanate thin films [M = lanthanoid] by chemical solution deposition technique

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 11 B, 2002, Pages 6820-6824

  Uchida, Hiroshi ^a   Yoshikawa, Hiroki ^a   Okada, Isao ^a   Matsuda, Hirofumi ^b   Iljima, Takashi ^b   Watanabe, Takayuki ^c   Funakubo, Hiroshi ^c  

^a SOPHIA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Bismuth titanate; Chemical solution deposition (CSD); Ferroelectrics; Ion codoped; Lanthanoids; P E hysteresis loop; Poly crystalline film; Vanadium

Indexed keywords

BISMUTH; FERROELECTRIC MATERIALS; POLARIZATION; VANADIUM;

BISMUTH TITANATE; CHEMICAL SOLUTION DEPOSITION (CSD); ION-CODOPED; LANTHANOIDS; P-E HYSTERESIS LOOP; POLY-CRYSTALLINE FILM;

THIN FILMS;

EID: 1642450387     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.41.6820     Document Type: Article

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