Evolution of Rayleigh constant in fatigued lead zirconate titanate capacitors

Applied Physics Letters

Volumn 80, Issue 19, 2002, Pages 3584-3586

  Sun, J L ^a   Chen, J ^a   Meng, X J ^a   Yu, J ^a   Bo, L X ^a   Guo, S L ^a   Chu, J H ^a  

^a SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AC ELECTRIC FIELD; CAPACITOR MODELS; INTERFACE CAPACITANCE; LEAD ZIRCONATE TITANATE; NUMBER OF CYCLES; RAYLEIGH CONSTANT; SIMPLIFIED METHOD; SQUARE PULSE;

CAPACITANCE; CAPACITORS; DOMAIN WALLS; ELECTRIC FIELDS; FERROELECTRIC FILMS; FERROELECTRICITY; PLATINUM;

SEMICONDUCTING LEAD COMPOUNDS;

EID: 79956043651     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1478781     Document Type: Article

References (14)

1. J. F. Scott and M. Dawber, Appl. Phys. Lett. 76, 3801 (2000). apl APPLAB 0003-6951
2. E. L. Colla, D. V. Taylor, A. K. Tagantsev, and N. Setter, Appl. Phys. Lett. 72, 2478 (1998). apl APPLAB 0003-6951
3. B. Li, F. Koch, X. J. Meng, J. G. Cheng, and J. H. Chu, Appl. Phys. Lett. 77, 898 (2000). apl APPLAB 0003-6951
4. D. Jiles, Introduction to Magnetism and Magnetic Materials (Chapman and Hall, London, 1991), pp. 85-175.
5. T. Nattermann, Y. Shapir, and I. Vilfan, Phys. Rev. B 42, 8577 (1990). prb PRBMDO 0163-1829
6. D. V. Taylor and D. Damjanovic, J. Appl. Phys. 82, 1973 (1997). jap JAPIAU 0021-8979
7. D. Bolten, U. Bottger, T. Schneller, M. Grossmann, O. Lohse, and R. Waser, Appl. Phys. Lett. 77, 3830 (2000). apl APPLAB 0003-6951
8. D. V. Taylor, D. Damjanovic, E. Colla, and N. Setter, Ferroelectrics 225, 91 (1999). fer FEROA8 0015-0193
9. J. J. Lee, C. L. Thio, and S. B. Desu, J. Appl. Phys. 78, 5073 (1995). jap JAPIAU 0021-8979
10. M. Tyunina, J. Levoska, and S. Leppavuori, Appl. Phys. Lett. 78, 527 (2001). apl APPLAB 0003-6951
11. X. J. Meng, J. G. Cheng, B. Li, S. L. Guo, H. J. Ye, and J. H. Chu, J. Cryst. Growth 208, 541 (2000). jcr JCRGAE 0022-0248
12. X. J. Meng, J. L. Sun, J. Yu, L. X. Bo, C. P. Jiang, Q. Sun, S. L. Guo, and J. H. Chu, Appl. Phys. Lett. 78, 2548 (2001). apl APPLAB 0003-6951
13. O. Boser, J. Appl. Phys. 62, 1344 (1987). jap JAPIAU 0021-8979
14. M. Brazier, S. Mansour, and M. McElfresh, Appl. Phys. Lett. 74, 4032 (1999). apl APPLAB 0003-6951