MOCVD of Cr3(C,N)2 and CrSixCy films: I. Growth and characterization

Journal of the Electrochemical Society

Volumn 152, Issue 8, 2005, Pages

  Gasqueres C ^a   Dominica, F D ^a   Maury, F ^a   Ossola, F ^b  

^a INSTITUT CARNOT CIRIMAT   (France)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; DEPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION;

AMORPHOUS STRUCTURES; COLD-WALL VERTICAL REACTORS; SINGLE-SOURCE PRECURSORS;

CHROMIUM COMPOUNDS;

EID: 25644458325     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1939486     Document Type: Article

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