MOCVD Route to Chromium Carbonitride Thin Films Using Cr(NEt2)4 as Single-Source Precursor: Growth and Mechanism

Chemical Vapor Deposition

Volumn 3, Issue 3, 1997, Pages 137-143

  Ossola, Franco ^b   Maury, Francis ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

^b CNR   (Italy)

Author keywords

Chromium carbonitride films; Hard metallurgical coatings; MOCVD; Pyrolysis mechanism; Single source precursor

Indexed keywords

EID: 0001393444     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.19970030305     Document Type: Article

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