Low-temperature thin-film deposition and crystallization

Science

Volumn 297, Issue 5578, 2002, Pages 65-

  Park, Sangmoon ^a   Clark, Benjamin L ^a   Keszler, Douglas A ^a   Bender, Jeffrey P ^a   Wager, John F ^a   Reynolds, Thomas A ^a   Herman, Gregory S ^a  

^a OREGON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROXIDE; MANGANESE OXIDE; OXIDE; SILICON; WATER; ZINC OXIDE; ZIRCONIUM OXIDE;

CRYSTALLIZATION; LOW TEMPERATURE;

CRYSTALLIZATION; ELECTRON MICROSCOPY; FILM; PRECIPITATION; PRIORITY JOURNAL; SHORT SURVEY; TECHNIQUE; TEMPERATURE; X RAY POWDER DIFFRACTION;

EID: 0037025145     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.1072009     Document Type: Short Survey

References (8)