Effect of hard bake process on LER

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 862-869

  Padmanaban, Munirathna ^a   Rentkiewicz, David ^a   Lee, SangHo ^a   Hong, Chisun ^a   Lee, Dongkwan ^a   Rahman, Dalil ^a   Sakamuri, Raj ^a   Dammel, Ralph R ^a  

^a AZ Electronic Materials USA Corp   (United States)

Author keywords

193nm resists; Flash hard bake; Hard bake; LER

Indexed keywords

193NM RESISTS; FLASH HARD BAKE; HARD BAKE; LINE-EDGE ROUGHNESS (LER);

GLASS TRANSITION; LIGHTING; MELTING; POLYMERS; SURFACE ROUGHNESS; THERMAL EFFECTS;

PHOTORESISTS;

EID: 24644514810     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.604401     Document Type: Conference Paper

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