The estimated impact of shot noise in extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 397-405

  Cobb, Jonathan ^a   Houle, Frances ^b   Gallatin, Gregg ^c  

^a MOTOROLA INC   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Contact holes; Extreme ultraviolet lithography; Photolithography simulation; Shot noise

Indexed keywords

COMPUTER SIMULATION; DISSOLUTION; ELECTRIC CONTACTS; LIGHT ABSORPTION; MONTE CARLO METHODS; PHOTORESISTS; SHOT NOISE; STATISTICAL METHODS; SURFACE CHEMISTRY; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

CENTROID POSITION JITTER; CONTACT HOLES; CONTACT LAYER LITHOGRAPHY; DIAMETER FLUCTUATIONS; EDGE ROUGHNESS STATISTICS; EXTREME ULTRAVIOLET LITHOGRAPHY; IMAGE ANALYSIS ROUTINES; PHOTOACID CONCENTRATION; PHOTON ABSORPTION SIMULATION; RESIST CHEMISTRY;

LITHOGRAPHY;

EID: 0141613046     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484730     Document Type: Conference Paper

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